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Aluminum Chromium Targets

Aluminum Chromium Targets are essential components in thin film deposition processes for industries like electronics and optics. They consist of a precise blend of aluminum and chromium materials, carefully manufactured to meet specific purity and composition requirements. These targets are used in physical vapor deposition (PVD) techniques to deposit thin layers of aluminum-chromium compounds onto substrates, forming coatings with desired properties such as corrosion resistance and durability. As suppliers, we ensure high-quality Aluminum Chromium Targets that enable efficient and reliable thin film deposition for various industrial applications.

AlCr Sputtering Target

  • Moisture:Nil
  • Product Type:Metal
  • Purity:High
  • Hardness:Rigid
  • Material:Stainless Steel
  • Alloy:Yes
  • Supply Ability:5000 Per Month

AlCrB Sputtering Target

  • Material:Stainless Steel
  • Hardness:Rigid
  • Purity:High
  • Moisture:Nil
  • Product Type:Metal
  • Alloy:Yes
  • Supply Ability:5000 Per Month
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